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Title: Patterning of oxide-hardened gold black by photolithography and metal lift-off

Source: Infrared Physics & Technology, Volume 62, 2014; pp. 94–99.

Author(s): Panjwani, Deep; Yesiltas, Mehmet; Nath, Janardan; Maukonen, D.E.; Rezadad, Imen; Smith, Evan M.; Peale, R.E.; Hirschmugl, Carol; Sedlmair, Julia; Wehlitz, Ralf; Unger, Miriam; Boreman, Glenn

Publication Year: 2014  View PDF »

Category: Journal Articles
Associated Research Project(s):   FPL-4712-1B

Abstract: A method to pattern infrared-absorbing gold black by conventional photolithography and lift-off is described. A photo-resist pattern is developed on a substrate by standard photolithography. Gold black is deposited over the whole by thermal evaporation in an inert gas at ~ 1 Torr. SiO2 is then deposited as a protection layer by electron beam evaporation. Lift-off proceeds by dissolving the photoresist in acetone. The resulting sub-millimeter size gold black patterns that remain on the substrate retain high infrared absorption out to ~5 μm wavelength and exhibit good mechanical stability. This technique allows selective application of gold black coatings to the pixels of thermal infrared imaging array detectors.

Keywords: Gold black; Pattering; MEMS; Photolithography; Infrared; Bolometer

Publication Review Process: Formally Refereed

File size: 1,603 kb(s)

Date posted: 04/30/2015

This publication is also viewable on Treesearch:  view
RITS Product ID: 72723

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