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Title: Nanomechanical study of amorphous and polycrystalline ALD HfO2 thin films

Source: International journal of surface science and engineering. Vol. 5, nos. 2/3 (2011): p. 193-204.

Author(s)Tapily, K.; Jakes, J.E.; Gu, D.; Baumgart, H.; Elmustafa, A.A.

Publication Year: 2011  View PDF »

Category: Journal Articles
Associated Research Project(s):   FPL-4707-3A

Abstract: Thin films of hafnium oxide (HfO2) were deposited by atomic layer deposition (ALD). The structural properties of the deposited films were characterised by transmission electron microscopy (TEM) and X-ray diffraction (XRD). We investigated the effect of phase transformations induced by thermal treatments on the mechanical properties of ALD HfO2 using nanoindentation. The elastic modulus of the amorphous low temperature deposited ALD HfO2 films was measured to be 370 ± 20 GPa. Subsequent to crystallisation by annealing in a rapid thermal annealing (RTA) chamber, the elastic modulus dropped to 240 ± 20 GPa. Similarly, the Meyer hardness decreased from a value of 18 ± 1 GPa for amorphous HfO2 to 15 ± 1 GPa following the transition temperature from amorphous to polycrystalline HfO2.

Keywords: OAtomic layer deposition; ALD; nanoindentation; high-k dielectrics; modulus; hardness; hafnium oxide; HfO2; thin films; mechanical properties; metallic oxides; dielectric films; nanostructured materials; microstructure; nanotechnology; testing; elasticity; modulus of elasticity; transmission electron microscopy; temperature; crystallization; polycrystals; atomic layer deposition; heat treatments

Publication Review Process: Formally Refereed

File size: 919 kb(s)

Date posted: 09/29/2011

This publication is also viewable on Treesearch:  view
RITS Product ID: 40170
Current FPL Scientist associated with this product
Jakes, Joseph
Research Materials Engineer

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